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3 These methods are destructive
all of which have been previously calibrated by a suitable method recommended by the manufacturer
SEMI 3D12-1020 (technical revision)
The purpose of this Document is to provide specification for chlorine (Cl2) that is used in the semiconductor industry
本仕様におけるマーキングシンボルは，従来の
C03500 - SEMI C35 - Specification and Guide for Nitric Acid Revision:SEMI C35-0301 - Superseded 3 These methods are destructiveNOTICE: This Standard or Safety Guideline has an Inactive Status because the conditions to maintain Current Status have not been met. Inactive Standards or Safety Guidelines are available from SEMI and continue to be valid for use. 1 Purpose 1. 1 The purpose of this Standard is to standardize requirements for nitric acid used in the semiconductor industry and testing procedures to support those standards. Test methods have been shown to give