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この文書は，シリコンの
The scope of this Document covers a grade of trimethylphosphite used in the semiconductor industry
orgで入手可能になり，2004年7月発行に至る。
This edition was approved for publication by the global Audits and Reviews Subcommittee on April 28
本文書の目的は，半導体産業で使用される塩化水素（HCl）の仕様を提供することである。
C09300 - SEMI C93 - Guide for Determining the Quality of Ion Exchange Resin Used in Polish Applications of Ultrapure Water System Revision:SEMI C93-0522 - Superseded この文書は，シリコンのE This Standard was editorially modified in January 2024 to correct an error. Changes were made to 11. 2. 4. 1. This Standard describes a Guide for analysis of virgin high purity ion exchange (HPIX) resin suitable for use in ultrapure water (UPW) polish applications. Further information regarding UPW systems can be found in SEMI F61. The Guide focuses on analysis of HPIX resin used in UPW. This Guide recommends parameters and test conditions that will
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